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2011 Symposium on VLSI Technology
Sponsored by Electron Devices Society - ED
New concepts and breakthroughs in VLSI processes and devices including Memory, Logic, I/O, and I/F (RF/Analog/MS, Imager, MEMS, etc.) - Advanced gate stack and interconnect in VLSI processes and devices - Advanced lithography and fine patternig technologies for high density VLSI - New functional devices beyond CMOS with a path for VLSI implantation - Packing of VLSI devices including 3D - system integration - Processes and devices modeling of VLSI devices - Reliability related to the above devices -
Conference Details
Dates
14 Jun - 16 Jun 2011
Location
Rihga Royal Hotel
Kyoto, Japan
Web site
Contact
Phyllis Mahoney
VLSI
19803 Laurel Valley Place
USA Montgomery Village MD 20886
+1 301 527 0900
+1 301 527 0994 (fax)
phyllism@widerkehr.com
Conference #
18091
Attendance
500
Publications
Please see the conference Web site for full details.
Call for Papers for Conference Authors
Find details for paper and abstract submission.Abstract submission deadline: 24 Jan 2011
Notification of acceptance date: 22 Mar 2011
Conference Focus
- Science
