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Steve Chung (left) and Prof. Jack C. Lee |
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Steve Chung (left) and Prof. Jack C. Lee |
With April venues on both sides of the Pacific, University of Texas Prof. Jack C. Lee delivered a popular six-hour short course on gate dielectrics in Santa Clara, CA, and Hsinchu, Taiwan. Part of the Vanguard Series of independent short courses, the April short course is the fourth in the series begun in 2000.
The course provided a good review of the literature with a special emphasis on Lee's high-k gate dielectric research, which focuses on ZrO2 and Hf02, as well as the research of others. The questions and answers during both sessions indicated an informed interest in the latest research.
Industry participants in Santa Clara and Taiwan came from companies like Philips Semiconductor, SSTI, TSMC, and UMC. University participants came from Santa Clara Univ., UC Berkeley, Stanford, and National Chiao Tung Univ., as well as most of Taiwan's technology-oriented universities.
In building the series of short courses held at venues with heavy concentrations of semiconductor industry activity, EDS Taipei Chapter Chair, Steve Chung, was instrumental in defining the new role of Local Champion for the series. As a result, attendance was the best of the series.
The Short Course subcommittee approved the release of the videotapes for the 2000 short courses for distribution and sale at IEEE's online store ( shop.ieee.org/store ). The titles, which are Circuit Designs and Technology for RF-CMOS, Overview of Fiber Optic Communications, and Using Modeling to Resolve Design and Reliability Issues, are available in either NTSC or PAL format. They are also available from IEEE's Professional Development Institute.
For further information about these short courses, see http://www.ieee.org/eds/shortcourses.
Ilesanmi Adesida
University of Illinois
Urbana, IL
Emily Sopensky
The Iris Company
Austin, TX