Hot topics include Cu interconnects; reliability of deep sub-micron;
high speed, high frequency devices; new dielectric systems; and
reliability modeling and simulation.
The IRW is quite a bit different from a typical technical conference.
From the moment you arrive, after winding slowly back to the south
shore of Fallen Leaf Lake, you realize that you are taking part
in something special. Attendees stay in cabins without TVs or
phones, dress is casual (suits, ties and high heels are shunned),
affiliations are downplayed, and meals are taken at the lodge
dining room, family-style. Attendees of the workshop are expected
to participate actively. Most attendees will find themselves drawn
into technical discussions from the start. Every aspect of this
conference, from the isolated location to the format of the technical
program, is designed to get attendees to interact.
Located just a short scenic drive (less than two hours) from Reno,
the Stanford Sierra Camp is situated at 6000 ft in the High Sierra
on Fallen Leaf Lake. Attendees stay in cabins nestled amid the
pines and cedars along the shoreline. All cabins have decks and
breathtaking views of the lake and surrounding peaks (don't worry,
the cabins also have warm beds and hot showers; phone booths are
available in the lodge). This peaceful setting, free from the
distractions and annoyances of modern life, presents a terrific
opportunity to get to know your colleagues, including internationally
renowned experts. This is an opportunity not usually available
at bigger, more hectic reliability conferences. Instead of watching
TV, participants spend their evenings at poster sessions, discussion
groups, and special interest groups (SIGs), all with refreshments
provided to stimulate discussions.
One unique aspect of this workshop is the opportunity for attendees
to present a poster of their own research, no matter what state
it is in. Just arrange for space when you register or bring last-minute
results in your briefcase or backpack. There will even be opportunity
to present a short summary description for your poster. This a
great way to share that new project you are working on and to
get world-class feedback. The poster presentations are even eligible
for a two-page write up in the conference proceedings. The open
poster sessions, organized by Bill Tonti of IBM, are but one example
of the opportunities for interaction that sets the IRW apart from
other conferences.
Another distinction of the IRW is the moderated Discussion Groups
that are held in the evenings. Organized this year by Sylvie Bruyere
of ST Microelectronics, typical Discussion Groups are likely to
include topics such as Single Event Upsets (SEU), WLR Monitoring,
Product Qualification / Burn In, Gate Oxide Integrity, Electro
migration, and Designing for Reliability. Lively conversation
and debate among participants is promised and written summaries
will be included in the workshop proceedings.
For those with the stamina, the Discussion Groups are followed
by the Special Interest Group meetings or SIGs (as attendees refer
to them). The SIGs are composed of small groups of researchers
and engineers who often continue their conversations and collaborations
even after they leave the workshop. Attendees have the opportunity
to become part of an existing SIG or suggest a new topic and start
one of their own. Be warned, remnants of the SIG discussions sometimes
rage on into the wee hours of the morning.
Yet another advantage of attending the IRW is the Tutorial Program,
presented by world-class experts and included at no additional
cost. The tutorials review basic topics as well as the latest
developments and are designed to be beneficial both to newcomers
and experienced members of the reliability community. Organized
this year by Amr Haggag of Motorola, this year's tutorial program
will cover reliability tutorials on evolutionary and revolutionary
technologies. Tutorials will include the reliability physics and
chemistry of thin and high-k gate oxides, fast wafer level reliability
monitoring of product wafers, and process monitoring techniques.
In addition for the first time, tutorials on revolutionary technologies
beyond standard silicon will be presented.
Last, but certainly not least, attendees have Wednesday afternoon
off to enjoy activities such as hiking (with the annual trek to
the top of Mt. Tallac as a favorite goal), volleyball, canoeing,
biking, walking, or just conversing by the lake, all in the fresh
clean mountain air. This free afternoon is a great way not only
to network, but also to build long-lasting friendships.
Additional information about the workshop is available on the
IRW website at www.irps.org/irw,
or by contacting SAR Associates at 301 N. Madison Street; Rome,
NY 13440, Phone: 315-339-3968; fax: 315-336-9134. Note: If you
want to take part in this event, please register early as space
at the Stanford Sierra Camp is limited to roughly 120 attendees
and the workshop has sold out in the past.
On behalf of the 2003 Integrated Reliability Workshop Committee,
we look forward to meeting you in Lake Tahoe!
Michael Dion
Communications Chair
Intersil Corp.
Melbourne, FL, USA
