Graduate Student Awards

Mu Chen

Mu Chen (1974) received his B.E. degree in Engineering Physics in 1997 from Tsinghua University, Beijing, China. He is completing his Ph.D. degree in Biomedical Engineering, Duke University. He works in the SPECT Research Lab under the direction of Prof. Ron Jaszczak. His thesis work is on the evaluation of myocardial perfusion imaging using SPECT (Single Photon Emission Computed Tomograhy) protocols. His research interests include Receiver Operating Characteristics (ROC) analysis, mathematical observer model, and statistical image reconstruction algorithms. Upon completion of his graduate studies, Mu will join CPS Innovations, Inc. in Knoxville and work on PET research. He hopes to complete his dissertation defense in Janaury or early Febuary 2003.
Mu Chen can be reached at CPS Innovations, Inc, 810 Innovations Dr., Knoxville, TN 37932; Phone: +1 865 218-3320; Fax: +1 865 218-3010; E-mail: mu.chen@cpspet.com. He was nominated by Professor Ronald J. Jaszczak.

Zhiyu Chen

Zhiyu Chen (S’98) was born on May 2, 1971 in Sichuan, China. He received the B.E. degree in engineering physics in 1994 and the M.S. degree in 1997, both from Tsinghua University, Beijing, China. Currently, he is pursuing the Ph.D. degree in electrical engineering and is a Graduate Research Assistant at the University of Tennessee, (UT) Plasma Sciences Laboratory, Knoxville. His research interests include the physics and applications of the one atmosphere uniform glow discharge plasma (OAUGDP™), as well as VLSI design and microelectronics fabrication technology.
Mr. Chen is a student member of the AVS.
Mr. Chen developed two types of impedance matching circuitry for OAUGDP™ reactors, which cannot be matched with the existing impedance matching techniques that have been developed for radio-frequency and microwave plasma applications at low pressures. Mr. Chen also developed a comprehensive circuit model for OAUGDP™, and used PSpice™, a widely-used circuit simulation software, to simulate OAUGDP™ reactor systems, which has not been seen in the existing literature. His simulation results agree well with experimental data.
Mr. Chen is currently concentrating on his Ph.D. dissertation research topic—developing an OAUGDP™ plasma chemical vapor deposition (PCVD) thin film coater, which will be used to deposit silicon oxide barrier coatings and other functional thin films at atmospheric pressure. This work will break new ground in PCVD applications.
Mr. Chen has co-authored 10 archival papers in journals and conference proceedings and more than 25 poster papers, and he is the sole author of two journal papers.
Zhiyu Chen can be reached at the Plasma Sciences Laboratory, Electrical and Computer Engineering Department, University of Tennessee, Knoxville, TN 37996-2100; Phone +1 865 974-9699; E-mail zychen@utk.edu. He was nominated by Professor J. Reece Roth.