AWARDS

GRADUATE SCHOLARSHIP AWARDS

We are, as always, proud of the young people entering our field. These four individuals are especially noted by their faculty advisors for their “contributions to the fields of Nuclear and Plasma Sciences,” and were judged on “Evidence of scholarship such as academic record, reports, presentations, publications, research plans, related projects and related work experience. Participation in IEEE activities through presentations, publications, student Chapter involvement, etc., will also be considered.” (From the TAB Awards and Recognition Manual). We congratulate them all.

David M. French

David M. French received his B.S. in physics from Colorado State University in 2006. He is currently pursuing a Ph.D. degree in nuclear science with emphasis on plasmas at the University of Michigan, Ann Arbor.
David works in the Plasma, Pulsed Power, and Microwave Laboratory at the University of Michigan. His research is both experimental and simulation and his interests include laser based diagnostics on z-pinch experiments, high-current cathode development for the UM relativistic magnetron facility, and breakdown phenomena in high power microwave systems.


Brad W. Hoff

Brad W. Hoff (S’04) was born in St. Louis, MO, in 1976. He received a B.S. Degree in Physics from the U.S. Naval Academy, Annapolis, MD, in 1999. He received M.S.E degrees in nuclear engineering and electrical engineering from the University of Michigan in 2006 and 2007, respectively, and is currently pursuing a Ph.D. degree in nuclear engineering at the University of Michigan.
Upon graduation from the U.S. Naval Academy, he served five years in the U.S. Navy. During his service in the Navy, he successfully completed the Navy’s Nuclear Power Program and served as a nuclear trained officer aboard the aircraft carrier USS Enterprise (CVN 65).
His interests include high-power microwave sources and directed energy technology.


Daniel Loveless

Daniel Loveless (Graduate Student Member, IEEE) received the B.S. degree in electrical engineering from Georgia Institute of Technology, Atlanta, GA in 2004 and the M.S. degree in electrical engineering from Vanderbilt University, Nashville, TN in 2007.
He is currently a Graduate Research Assistant in the radiation effects and reliability group in the Department of Electrical Engineering and Computer Science at Vanderbilt University, Nashville, TN. While at Vanderbilt University his work has included the design of single-event hardened mixed-signal circuit topologies such as phase-locked loops, as well as the development of various techniques for the analysis of high-speed analog circuit topologies in radiation environments. His research interests include CMOS devices and technology, mixed-signal and analog circuit design, and radiation effects in CMOS microelectronics.
Mr. Loveless was awarded the Georgia Tech Alumni Association Scholarship from 2000 to 2004. In addition to being a member of IEEE, he is a member of the IEEE Nuclear Plasma and Sciences society, the IEEE Circuits and Systems Society, and Eta Kappa Nu Electrical Engineering Honor Society.


Jonathan A. Pellish

Jonathan A. Pellish (Graduate Student Member, IEEE) received the B.S. degree in physics from Vanderbilt University,
Nashville, TN in 2004 and the M.S. degree in electrical engineering from Vanderbilt University, Nashville, TN in 2006.
From 2002 to 2004, he was an Undergraduate Research Assistant in the Department of Physics and Astronomy at Vanderbilt University, Nashville, TN, working on heavy-ion- and photon-based materials analysis as well as several projects in experimental high-energy physics related to the BTeV experiment at Fermi National Laboratory, Batavia, IL. He is currently a Graduate Research Assistant in the radiation effects and reliability group in the Department of Electrical Engineering and Computer Science at Vanderbilt University, Nashville, TN. During the summer and fall of 2007, he held a Graduate-Level Co-Op position at the IBM Austin Research Laboratory as part of an IBM Ph.D. Fellowship. While at IBM, he worked on device- and circuit-level characterization of radiation effects in IBM's 45 nm SOI process. His research interests include SiGe devices and technology, radiation effects in CMOS, SOI, and SiGe microelectronics, device-level simulation, and massively-parallel simulation of radiation transport.
Mr. Pellish was awarded an IBM Ph.D. Fellowship for 2007-2008 academic year. He is a member of the physics honorary society Sigma Pi Sigma. In addition to being a member of the IEEE, he is also a member of the American Physical Society and the American Association for the Advancement of Science.

 


David M. French


Brad W. Hoff


T. Daniel Loveless


Jonathan A. Pellish

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 


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