Elyse Rosenbaum received the B.S. degree (with distinction) from Cornell University in 1984, the M.S. degree from Stanford University in 1985 and the Ph.D. degree from the University of California, Berkeley in 1992, all in electrical engineering. From 1984 through 1987 she was a Member of Technical Staff at AT&T Bell Laboratories in Holmdel, NJ. She is currently an Associate Professor in the Department of Electrical and Computer Engineering at the University of Illinois at Urbana-Champaign. Dr. Rosenbaum's present research interests include modeling and simulation of ESD protection circuits, gate oxide reliability, silicon-on-insulator, and analysis of substrate noise coupling. She has authored or co-authored over 50 technical papers. She has been the recipient of a Best Student Paper Award from the IEDM, a Technical Excellence Award from the SRC, and an NSF CAREER award.