John S. Suehle (SM ’95) received his B.S., M.S., and Ph.D. degrees in electrical engineering from the University of Maryland, College Park, in 1980, 1982, and 1988 respectively. Since 1982 he has been in the Semiconductor Electronics Division at the National Institute of Standards and Technology (NIST), Gaithersburg, MD, where he is leader of the CMOS and Novel Devices Group. His research activities include failure and wear-out mechanisms in semiconductor devices, radiation effects in microelectronic devices, micro-electro-mechanical-systems (MEMS), and metrology issues relating to future electronic devices. Dr. Suehle has authored or co-authored over 170 technical papers or conference proceedings and holds 5 U.S. patents. He has served as guest editor of the IEEE Transactions on Device and Materials Reliability and holds positions on the management committees of the IEEE International Electron Devices Meeting, IEEE International Reliability Physics Symposium, and the IEEE International Integrated Reliability Workshop. Dr. Suehle serves as the chairman of the Oxide Integrity Working Group of the EIA/JEDEC JC 14.2 Standards Committee and is a member of Eta Kappa Nu.