IEEE Cledo Brunetti Award Recipients

"For pioneering contributions to lithographic engineering and to high-density isolation technology."

 

2004 - STEPHEN Y. CHOU
Professor, Department of Engineering
Princeton University
Princeton, NJ

"For the invention and development of tools for nanoscale patterning, especially nanoimprint lithography, and for the scaling of devices into new physical regimes."

 

2003 - ANDREW NEUREUTHER
Professor, EECS
Univ of California
Berkeley, CA

"For pioneering contributions to modeling and simulation of the lithographic materials, processes, and tools used in microelectronics manufacturing."

 

2002 - MARK LUNDSTROM
Professor, Electrical & Computer Engineering, Purdue University
West Lafayette, Indiana

and

SUPRIYO DATTA
Thomas Duncan Distinguished Professor, Purdue University
West Lafayette, Indiana

'For significant contributions to the understanding and innovative simulation of nano-scale electronic devices.'

 

2001 - R. FABIAN W. PEASE
Stanford University - Stanford, CA

'For advancing high resolution patterning technologies, high performance thermal management, and scanning electron microscopy for microelectronics'

 

2000 - ROBERT E. FONTANA
IBM Almaden Research Center - San Jose, CA

'For contributions to micro fabrication techniques for the manufacture of thin film and giant magnetoresistive heads used in hard disk drives.'

 

1999 - DAVID K. FERRY
Arizona State University - Tempe, AZ

'For fundamental contributions to the theory and development of nanostructured devices.'

 

1998 - ROGER T. HOWE

and

RICHARD S. MULLER
University of California - Berkeley, CA

'For leadership and pioneering contributions to the field of microelectromechanical systems.'

 

1997 - DIETER P. KERN,

GEORGE A. SAI-HALASZ

and

MATTHEW R. WORDEMAN
IBM Research - Yorktown Heights, NY

'For the development of sub-0.1 micron MOSFET devices and circuits.'

 

1996 - MITSUMASA KOYANAGI
Tohoku Univ Intell Sys Lab - Sendai, Japan

'For pioneering research and development of the three dimensional stacked capacitor DRAM cell.'

 

1995 - HENRY I. SMITH
MIT - Cambridge, MA

'For contributions to microfabrication science and technology, notably microlithography.'

 

1994 - EIJI TAKEDA
Hitachi Ltd. - Tokyo, Japan

'For pioneering contributions to the characterization and understanding of hot-carrier effects in MOS devices.'

 

1993 - TAKAFUMI NAMBU
SONY Corp.,

MITSURU IDA
Tokyo, Japan

and

KAMON YOSHIYUKI

'For the development of the WALKMAN, the realization of a totally new concept of miniaturization of consumer electronics.'

 

1992 - DAVID A. THOMPSON
IBM Corp. - San Jose, CA

'For pioneering work in miniature magnetic devices for data storage, including the invention, design and development of thin-film and magnetoresistive recording heads.'

 

1991 - HIDEO SUNAMI
Hitachi, Ltd. - Tokyo, Japan

'For contributions in the invention and development of the trench capacitor DRAM cell.'

 

1990 - ELSE KOOI
Philips Research Labs. - Sunnyvale, CA

'For invention and development of the process for localized oxidation of silicon using a silicon nitride mask, which enabled greatly reduced dimensions in VLSI circuits.'

 

1989 - SHUN-ICHI IWASAKI
Tohoku Univ. - Sendai, Japan

'For contributions to the miniaturization of magnetic recording systems.'

 

1988 - IRVING AMES
IBM Corp., NY

FRANCOIS M. d'HEURLE

and

RICHARD E. HORSTMANN

'For the invention of electromigration-resistant copper-doped aluminum metallurgy.'

 

1987 - MICHAEL HATZAKIS
IBM Corp. - Yorktown Heights, NY

'For fundamental contributions to the patterning techniques of submicron electron devices.'

 

1986 - RICHARD M. WHITE
Univ. of California - Berkeley, CA

'For invention of surface acoustic wave electronic devices for signal processing applications.'

 

1985 - ALEC N. BROERS
IBM Corp. - Hopewell Junction, NY

'For leadership and pioneering contributions to the technology and applications of electron beams to fine line lithography.'

 

1984 - HARRY W. RUBINSTEIN
Sprague Electric Co.

'For early key contributions to the development of printed components and conductors on a common insulating substrate.'

 

1983 - ABE OFFNER
Perkin-Elmer Corp.
Wilton, CT

'For the invention and design of the optics which made possible the projection lithography systems that were key to advancing integrated circuit manufacture.'

 

1982 - ROBERT H. DENNARD
IBM Corp.
Yorktown Heights, NY

'For the invention of the one-transistor dynamic random access memory cell and for contributions to scaling of MOS devices.'

 

1981 - DONALD R. HERRIOTT
Bell Labs.
Murray Hill, NJ

'For key contributions to the development of a practical electron beam system for fabrication of integrated circuit masks and to other aspects of microlithography.'

 

1980 - MARCIAN E. HOFF, JR.
INTEL Corp.
Santa Clara, CA

'For the conception and development of the microprocessor.'

 

1979 - GEOFFREY W. A. DUMMER
Worcestershire, England
and
PHILIP J. FRANKLIN
GSA, Federal Supply Service
Washington, DC

'For contributions to materials development and fabrication techniques for miniature passive electronic components and assemblies.'

 

1978 - JACK S. KILBY
Texas Instrument
Dallas, TX
and
ROBERT N. NOYCE
Intel Corporation
Santa Clara, CA

'For contributions to miniaturization through inventions and the development of integrated circuits.'